Perpendicular Resym on uneven surface (proper method of copying details elsewhere)?


#1

I know you can turn tools 45-degrees to get them to apply symmetry perpendicularly with masks but only if the 2 sides are the same size, but in my case I have roughly a rectangular prism where one side is longer than the other:

I’m assuming this might’ve just been bad planning of not applying the alphas uniformly throughout both sides before layering on new alphas over them, but is there any way to achieve the same layout of alpha patterns (with the same depth and size and the spacing inbetween the alpha patterns) made on the detailed side and mirror it over to the longer side?


#2

Not directly, but you could duplicate your tool, rotate it, and project the details. This will involve some manual work though.

Or you could duplicate several times, rotate, align it all round, and then dynamesh it all as one.